n&k Technology

Semiconductor ManufacturingUnited States51-200 Employees

Squeeze info from every photon!  Control micro- to nano-scale device fabrication like the world’s leaders - using state-of the art optical metrology systems from n&k Technology.

In-line metrology for high-volume manufacturing (HVM) of discrete and integrated circuit (IC) semiconductors, CMOS Image Sensors, MEMS, photomasks, hard-disk drives, solar cells, and flat panel displays.  Thickness systems quantify n- and k-spectra, and band-gaps of ultra-thin to ultra-thick multi-layer deposited stacks,  and of epi-silicon, SOI, and GaN-on-Si.  Scatterometer systems for Optical Critical Dimension (OCD) control of small- to large-pitch complex patterns including deep trenches, contact holes, and high aspect-ratio 3D structures in advanced devices.

n&k Technology was founded by Drs. Rahim Forouhi and Iris Bloomer in California in 1992, to provide state-of-the-art optical metrology tools and support services:
The broadest DUV-Vis-IR broadband spectrophotometry using patented reflective optics,
Our founders derived the Forouhi-Bloomer equations and built the core software,
Applications knowledge from >30 years of dedication to industrial metrology, and
Field-proven, production-worthy, fast, and non-destructive patterning process control.

If you can make it, we can measure it.

www.nandk.com

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