CMP Market Target Real-time SlurryScope provides direct defect reduction and cost savings by eliminating slurry dilution and by correlating particle data to specific wafers; ideal for CMP equipment OEMs, semiconductor fabs, slurry suppliers, and filter manufacturers.

Data-Driven Edge Time-stamped, real-time particle data enables seamless integration with MES and analytics platforms, creating a foundation for data-driven yield optimization partnerships and value-added services.

Early Stage Partnerships With a small team and modest revenue, channel partnerships and OEM collaborations will be essential. Target pilots with leading CMP tool vendors and early-adopter fabs to establish reference wins.

Unique Value Proposition By removing dilution errors and delivering wafer-specific particle data, SlurryScope differentiates from traditional slurry inspection and supports extended filter life, improved CMP consistency, and lower wafer-processing costs.

Market Opportunity Inline metrology and yield control are growing priorities in semiconductor manufacturing; leverage partnerships with equipment integrators and distributors to scale beyond the US and accelerate adoption.